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- THE RESEARCH OF REACTION ION ETCHING AND ION ETCHING METHODS 反應離子刻蝕與離子刻蝕方法的研究與比較
- The reactor is capable of working in the RIE (reactive ion etching) mode and also in the plasma etching mode. 反應腔擁有在RIE(反應離子刻蝕)模式和等離子刻蝕模式下工作的能力。
- Yak hairs were treated by the microwave electron cyclotron resonance plasma reactive ion etching (ECR-RIE) equipment to improve its property of weave. 摘要采用微波電子回旋共振等離子體反應離子刻蝕(ECR-RIE)裝置對牦牛毛纖維進(jìn)行表面改性，從而改善牦牛毛的可紡性。
- The experiment of fully automatic reactive ion etching on 3 inch GaAs wafer is described. 介紹了全自動(dòng)反應離子腐蝕3英寸GaAs片的實(shí)驗研究工作。
- A patterned DLC thin film cath ode was fabricated by reactive -ion etching method and mic ro -fabrication technology. 通過(guò)離子束技術(shù)和微細加工技術(shù)可以實(shí)現DLC薄膜的圖形化并能大大提高薄膜的場(chǎng)發(fā)射性能。
- The arrays were subsequently treated with reactive ion etching (RIE) to slightly reduced the size of the sphere. 制程的開(kāi)發(fā)首先利用黃光微影制作有高低差的溝槽圖樣，再將單層奈米球排入溝槽之中。
- It indicates that the plasma-assisted etching method is very valid to fabricate deep grating. 通過(guò)等離子體輔助刻蝕技術(shù)制作出了立方狀亞波長(cháng)抗反射光柵。
- The ice etching method was adapted to duplicate the form of grains in microvilli membrane. 采用冰凍蝕刻法復制微絨毛膜膜內粒子形態(tài)。
- Reactive ion etching (RIE) process utilized to form giant magnetoresistive (GMR) spin valve sensing elements was investigated experimentally. 對巨磁電阻自旋閥磁場(chǎng)傳感器制作中的關(guān)鍵技術(shù)之一:自旋閥薄膜的反應離子刻蝕(RIE)工藝,進(jìn)行了試驗研究。
- This paper describes a new crosshatching technology on PI flexible substrate, using chemically etching method. 本文介紹一種在撓性聚酰亞胺基材上開(kāi)窗口的新工藝。
- Yak hairs were treated by the microwave electron cy cl otron resonance plasma reactive ion etching(ECR-RIE) equipment to improve its property of weave. 采用微波電子回旋共振等離子體反應離子刻蝕(ECR-RIE)裝置對牦牛毛纖維進(jìn)行表面改性,從而改善牦牛毛的可紡性。
- Austenite grain size of plain carbon steel and alloy steel were examined by oxidization and grain boundary etching method. 采用氧化法和晶粒邊界腐蝕法對幾種不同的碳鋼和合金鋼的奧氏體晶粒的顯示進(jìn)行了對比試驗。
- In the table below, if a blaze wavelength is indicated, the grating has been optimized for the indicated wavelength and has been blazed by means of ion etching. 下表中標有閃耀波長(cháng)的光柵為離子刻蝕光柵,在閃耀波長(cháng)處優(yōu)化。
- This research is base on the recent technology of grinding process, and then apply the batch etching method to improve the wafer thining. 本研究建立在現行輪磨可達到的薄化基礎上，以批次式蝕刻方式將矽晶圓做更進(jìn)一步的薄化。
- A two-dimensional (2D) physical model of reactive ion etching (RIE) which includes isotropic and anisotropic components is presented.The physical model is analyzed. 摘要反應離子刻蝕(RIE)的二維物理模型，包括各向同性和各向異性?xún)刹糠帧?/li>
- The chemical etching method wa applied to form surface texture of multicrystalline silicon in order to reduce the reflectance of the surface. 為了降低光在多晶硅表面的反射,采用化學(xué)腐蝕法在其表面制備了絨面。
- The influence of chamber pressure,gas flow rate and RF power on micro loading effect in reactive ion etch of silicon dioxide is researched. 結果表明,通過(guò)對反應室壓力、刻蝕氣體流量和射頻功率的調節,可以降低微負載效應的影響,得到良好的刻蝕均勻性。
- We found that the mole ratio of the raw materials, gelling temperature, carbonization temperature and etching method could effect the pore structures of the porous carbons. 研究發(fā)現，影響多孔炭孔結構的主要因素是原料的摩爾比，另外還與膠凝溫度、炭化溫度、刻蝕方式有關(guān)。
- We found that the mole ratio of the raw materials,gelling temperature,carbonization temperature and etching method could effect the pore structure of the porous carbons. 研究發(fā)現,影響多孔炭孔結構的主要因素是原料的摩爾比,另外還與膠凝溫度、炭化溫度、刻蝕方式有關(guān)。
- With the aid of a water-heater controllable in both temperature and time, the chemical etching method adding a bit hydrofluoric acid and xylene in traditional picric acid sa... 結果表明:利用控溫控時(shí)水浴鍋采用傳統飽和苦味酸滴加微量氫氟酸和二甲苯的試劑可清晰顯示不同狀態(tài)下的奧氏體晶界。
