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- The application of Freeman ion source linked to LC-2A ion implanter is described in the paper. 本文敘述了弗里曼(Freeman)離子源體聯(lián)接在LC-2A型中能離子注入機上的應用;
- KEYWORDS : GIMS, ion source, anode layer, sputtering, TiN, ion plating, medium frequency, pulsed DC. 中文關(guān)鍵詞：氣離濺射、離子源、陽(yáng)極層流、濺射、氮化鈦、離子鍍膜、中頻、脈沖直流。
- TITAN ion source is a new ion source which can produce strong metal and gas ion beam. Use . TITAN離子源是一種新的能夠同時(shí)產(chǎn)生強金屬和氣體離子束流的離子源。
- KEYWORDS: GIMS, ion source, anode layer, sputtering, TiN, ion plating ， medium frequency, pulsed DC. 中文關(guān)鍵詞：氣離濺射、離子源、陽(yáng)極層流、濺射、氮化鈦、離子鍍膜、中頻、脈沖直流。
- An intense ECR ion source for ADS (accelerator driven sub-critical system) is described. 介紹了正在研制的一臺強流ECR離子源。
- The MC-SNICS ion source of NEC compact AMS system at the AMS laboratory of Peking University was upgraded recently. 摘要為提高樣品測量效率，對MC-SNICS多靶位銫濺射負離子源進(jìn)行了升級改進(jìn)。
- Electric field of the emission system of a liquid metal ion source was simulated, based on the conventional dynamic protrusion model and the widely used charge simulation method. 摘要發(fā)射系統是液態(tài)金屬離子源的關(guān)鍵部件之一，它的性能的優(yōu)劣直接影響到整個(gè)離子源的工作穩定性和可靠性。
- In addition, the requirement of delivering 18O2 beams from the electron cyclotron resonance ion source can be satisfied by the obtained 18O2 gas. 此外,制得的氣體能夠滿(mǎn)足電子回旋共振離子源提供18O重離子束的實(shí)驗要求。
- Then the corresponding sigma matrix is given to further estimate the beam emittance extracted from electron cyclotron resonance ion source. 用旋轉矩陣和聚焦矩陣重新推導了總的傳輸矩陣。
- Abstract The MC-SNICS ion source of NEC compact AMS system at the AMS laboratory of Peking University was upgraded recently. 摘要 為提高樣品測量效率，對MC-SNICS多靶位銫濺射負離子源進(jìn)行了升級改進(jìn)。
- The purpose of the first part of this work has been to use an electromagnet to improve the performance of the Kaufman ion source. 電漿的電子，離子密度與溫度是了解電離層結構的幾個(gè)重要參數，而為了量測這些參數，科學(xué)家使用了數種實(shí)地量測的技術(shù)。
- Because of the structure limitation, working state of the ECR ion source could not be judged by the color of gas discharging in discharge chamber. 由于受結構的限制，ECR離子源不能像高頻源離子源那樣通過(guò)觀(guān)察氣體放電的顏色判斷其工作狀態(tài)，所以在運行中調節狀態(tài)非常困難。
- A new electron impact storage ion source has been designed for time of flight mass spectrometers with a high mass resolving power and high sensitivity. 電子轟擊存貯型脈沖離子源是為高分辨率、高靈敏度飛行時(shí)間質(zhì)譜儀設計的新型離子源。
- Some key problems such as pre-bunching between the ion source and the RFQ, H-minus Lorentz stripping in the medium energy cyclotron, flat-top acceleration etc. have been studied. 對其中的一些關(guān)鍵性問(wèn)題如從離子源到RFQ的預聚束問(wèn)題等進(jìn)行了較為深入的研究。
- Institute of Modern Physics of CAS. The main parameters of superconducting ECR hydronium ion source have reached the highest level in the world[N]. Science Times, [2006-02-14]. 近代物理研究所.;超導高電荷態(tài)ECR離子源主要性能達國際最好水平[N]
- Three sets of arcing tests were carried out by way of regulating three influencing parameters on the arc current of ion source for DNB(diagnostic neutral beam)system,ie. 通過(guò)調節影響診斷中性束離子源弧流的進(jìn)氣量、燈絲電流和弧壓三個(gè)參量,進(jìn)行了三組離子源起弧實(shí)驗。
- ABSTRACT: In this paper a reactive ion plating method and system configuration of Gas Ion source enhanced Magnetron Sputtering (GIMS) is presented in details. 摘要：本文詳細介紹了氣體離子源增強磁控濺射（氣離濺射）反應離子鍍膜技術(shù)和系統配置。
- OSTRIKOV K N,DENYSENKO I B,TSAKADZE E L,et al.Characteristics of electron cyclotron resonance plasmas for large area ion source application[J].Journ Vac Sci Technol,2000,A20:2185. 丁振峰;霍偉剛;王友年.;射頻電感性耦合等離子體調諧基片自偏壓特性[J]
- General Plasma Inc. (GPI) today announced the completion of its acquisition of the Ion Source product line from Advanced Energy Industries, Inc., based in Fort Collins, Colorado. 一般等離子公司（ GPI ）的公司今天宣布完成其收購的離子源的產(chǎn)品線(xiàn)從先進(jìn)能源工業(yè)公司，總部設在柯林斯堡，科羅拉多州。
- The method of experimentation is used to research the ionization efficiency in dielectric barrier discharge ion source in condition of gas s different flux. 采用實(shí)驗方法研究了介質(zhì)阻擋放電離子源對乙醇樣品標準氣在不同的流量條件下離子源電離效率的問(wèn)題。
