ABSTRACT: In this paper a reactive ion plating method and system configuration of Gas Ion source enhanced Magnetron Sputtering (GIMS) is presented in details.

 
  • 摘要:本文詳細介紹了氣體離子源增強磁控濺射(氣離濺射)反應離子鍍膜技術(shù)和系統配置。
今日熱詞
目錄 附錄 查詞歷史
国内精品美女A∨在线播放xuan