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- A physical vapour deposition process applies the low friction, ceramic coating. 用物理蒸汽沉淀工藝施加低摩擦陶瓷涂層。
- The continuous SiC fibers coated with B 4C using chemical vapour deposition(CVD) were made. 采用化學(xué)氣相沉積 (CVD)方法 ,在連續SiC纖維表面沉積一層B4C涂層。
- Developments of diamond films by plasma chemical vapour deposition are reviewed in the paper. 本文評述了化學(xué)氣相沉積法制備人造金剛石薄膜的進(jìn)展情況。
- A very thin applied or deposited coat of metal. 薄板很薄的應用的或沉淀的一層金屬。
- The desensitized explosive PETN film was prepared by physical vapour deposition (PVD) technology, and SEM was used to analyze the microstructure and grain size of PETN film. 摘要采用物理氣相沉積(PVD)技術(shù)研制了鈍化太安炸藥薄膜，對薄膜的微觀(guān)結構和顆粒粒度進(jìn)行了分析，對顆粒粒度與薄膜爆轟波穩定傳播臨界尺寸的關(guān)系進(jìn)行了探索。
- This paper reviews comprehensively the recent development of amor- phous silicon films fabricated by light induced chemical vapour deposition(LCVD). 本文較系統地評述了光誘導化學(xué)汽相淀積(LCVD)技術(shù)淀積非晶硅薄膜的開(kāi)發(fā)現;
- Thin film of tellurium was prepared by chemical vapour deposition on the polyethylene foils using room-temperature decomposition of electrochemically generated hydrogen telluride. 用化學(xué)氣相沉積法制備碲薄膜,其步驟為:通過(guò)電化學(xué)方法制得碲化氫,碲化氫在室溫下分解后在聚乙烯塑料箔上沉積得到碲薄膜。
- TiO 2 thin films were prepared by chemical vapour deposition(CVD) with the source of tetra iso propyl titanate (Tiliso OC 3H 7) 4,TPT) and its optical properties are studied. 以四異丙醇鈦（簡(jiǎn)稱(chēng)TPT）為鈦源物質(zhì)，采用常壓化學(xué)氣相沉積（CVD）法制備了TiO2膜，并對其光學(xué)性質(zhì)進(jìn)行了研究。
- The desensitized explosive PETN film was prepared by physical vapour deposition(PVD) technology,and SEM was used to analyze the microstructure and grain size of PETN film. 采用物理氣相沉積(PVD)技術(shù)研制了鈍化太安炸藥薄膜,對薄膜的微觀(guān)結構和顆粒粒度進(jìn)行了分析,對顆粒粒度與薄膜爆轟波穩定傳播臨界尺寸的關(guān)系進(jìn)行了探索。
- New advance in chemical vapour deposition(CVD) , physical vapour deposition(PVD) .surfacemodification technology and other new technology in surface treatment were reviewed. 簡(jiǎn)要地評述了化學(xué)氣相沉積(CVD)、物理氣相沉積(PVD)、表面改性技術(shù)和其它表面處理技術(shù)的新進(jìn)展。
- The two major techniques used are Chemical Vapour Deposition (CVD) and Physical Vapour Deposition (PVD).These can result in the deposition of two-dimensional blanket or patterned thin films. 因此本實(shí)驗中將凹形及矩形之銅箔以疊加方式組合成一電極群，并藉由微細放電加工方法加工出具有數十道槽狀的微細散熱片。
- The vapour generator for chemical vapour deposition plants allows the extraction of vapours. 用于化學(xué)汽相沉積器的蒸汽發(fā)生器允許蒸汽抽提。
- Performanceer of deposition coating 沉積層性能
- Physical and chemical vapour deposition 物理、化學(xué)氣相沉積
- The text brief introduced auto deposition coatings and auto deposition painting technology.And analysed the merits and demerits of auto deposition painting technology. 簡(jiǎn)要介紹了自泳涂料與自泳涂裝技術(shù),分析了自泳涂裝的優(yōu)缺點(diǎn)。
- chemical vapour deposition ( CVD ) 化學(xué)氣相沉積法（CVD）
- chemical vapour deposition (CVD) 化學(xué)氣相沉積
- The obtained results indicate that the weld deposited coating of boronic stainless steel has better resistance to cavitation eroion,while weld deposited coating of WC ceramics is a better barrier to erosion and abrasion. 結果表明 ,硼不銹鋼堆焊層是較好的抗汽蝕材料 ,但抗磨蝕效果不理想 ;
- thermally activated chemical vapour deposition 熱活化化學(xué)氣相沉積
- Structure analysis showed that the mechanical deposited coating was not consisted of flat zinc particles but the pile\|up of different size zinc powders, which filled in the interspaces of coating. 結構分析表明,機械鍍鋅層不是扁平狀鋅粉的層層鑲嵌疊加,而是尺寸大小不同的鋅粉顆粒相互填充堆積;
