This paper reviews comprehensively the recent development of amor- phous silicon films fabricated by light induced chemical vapour deposition(LCVD).

 
  • 本文較系統地評述了光誘導化學(xué)汽相淀積(LCVD)技術(shù)淀積非晶硅薄膜的開(kāi)發(fā)現;
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