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- Copy now the mask layer, applying to it Filter -Blur -Gaussian Blur. 復制面膜層,點(diǎn)擊濾鏡-模糊-高斯模糊。
- Oxygen ions are injected into the semiconductor substrate using the mask layer. 使用掩模層氧離子被注入到半導體基片中。
- We supply consumables for test and assembly, as well as packaging, semiconductor fabrication related equipments such as lithography mask aligner, anodic bonder, and etc. ACCULEX 消耗品供應的芯片測試和裝配，以及包裝材料，半導體制造相關(guān)設備，如光刻掩模同步，陽(yáng)極焊機，等你可以指望我們的晶圓制造設備（提，林研究，瓦里安，珀金埃爾默， SVG的）備件。
- Make the mask layer look darker, using the next command Image -Adjustments -Brightness/Contrast . 點(diǎn)擊圖像-調整-亮度/飽和度將面膜層調暗。
- The mask layer is very useful when you want to use one font as a template for another font. 如果你想用一個(gè)現有字體來(lái)作為設計另一個(gè)字體的模板，那模板層就很有用了。
- Abstract： A non-linear photochromic mask layer can be utilized for super-resolution optical data storage. 摘 要： 利用光致變色介質(zhì)的非線(xiàn)性效應特性制成掩膜，可以實(shí)現超分辨率光存儲。
- A non linear photochromic mask layer can be utilized for super resolution optical data storage. 利用光致變色介質(zhì)的非線(xiàn)性效應特性制成掩膜,可以實(shí)現超分辨率光存儲。
- An ion injection mask layer is formed that exposes a device isolation region on a low concentration first conductive type semiconductor substrate. 離子注入掩模層被形成，其暴露低濃度的第一傳導類(lèi)型半導體基片上的裝置隔離區。
- It supports shape design, motion tween creation , guideline, mask layer, stream and event sound, frame label, setting movieclip instance name and more. 它支持圖形設計、運動(dòng)動(dòng)畫(huà)、引導線(xiàn)、遮罩效果、流聲音和事件聲音、幀標記、設置電影剪輯、按鈕等符號。
- For example, you can put the sans-serif version of the typeface into the mask layer while you are working on the serif version in the outline layer. 例如，你可以在模板層中放置一個(gè)字體的無(wú)襯線(xiàn)版本，然后在輪廓層制作這個(gè)字體的襯線(xiàn)版本。
- Select the magnifying glass and masked layer together. 選擇放大鏡鎖在圖層,一起添加蒙板。
- Simulation of X-ray Lithography Mask Distortion during Back-etching X射線(xiàn)光刻掩模背面刻蝕過(guò)程中的形變仿真
- Wafers containing these VCA die are partially processed and staged at the foundry.All of the analog and digital resources can be interconnected and configured by a single mask layer of vias. 包含這些VCA的晶片經(jīng)過(guò)特殊處理和鑄造，所有的模擬和數字資源可相互聯(lián)系并由一個(gè)遮罩層來(lái)配置。
- Exetreme Ultraviolet Lithography Masks Technology 極紫外投影光刻掩模技術(shù)
- In early IC fabrication practice, etch bias was usually dealt with by introducing an appropriate amount of compensation in the masking layer. 在早期的集成電路制作實(shí)踐中，刻蝕偏差通常是通過(guò)在掩膜層上引入一個(gè)適量的修正來(lái)處理的。
- Transient Thermal Analysis of X-ray Lithography Mask During Post-exposure baking X射線(xiàn)光刻掩模后烘過(guò)程的瞬態(tài)熱分析
- "Pattern transfer" refers to the transfer of a pattern, defined by a masking layer, into a film or substrate by chemical or physical methods that produce surface relief. “圖形轉移”是指把掩膜層所確定的圖形通過(guò)能產(chǎn)生表面轉移的化學(xué)或物理方法轉移到薄膜上或襯底上去。
- He wore a mask so that no one should recognize him. 他戴了一個(gè)面罩，使別人認不出他來(lái)。
- "Pattern transfer" refers to the transfer of a pattern, defined by a masking layer, into a film or substrate by chemical or physical methods that produce surface relief . “圖形轉移”是指把掩膜層所確定的圖形通過(guò)能產(chǎn)生表面轉移的化學(xué)或物理方法轉移到薄膜上或襯底上去。
- The graphic arts include calligraphy and lithography. 平面造型藝術(shù)包括書(shū)法和平版印刷術(shù)。
