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- The vapour generator for chemical vapour deposition plants allows the extraction of vapours. 用于化學(xué)汽相沉積器的蒸汽發(fā)生器允許蒸汽抽提。
- Metal organic chemical vapour depositi. 金屬有機物化學(xué)氣相沉積。
- Applications of vapour generation atomic spectrometry for the determination of cadmium. 鎘的氣體發(fā)生原子光譜法測定。
- The continuous SiC fibers coated with B 4C using chemical vapour deposition(CVD) were made. 采用化學(xué)氣相沉積 (CVD)方法 ,在連續SiC纖維表面沉積一層B4C涂層。
- Developments of diamond films by plasma chemical vapour deposition are reviewed in the paper. 本文評述了化學(xué)氣相沉積法制備人造金剛石薄膜的進(jìn)展情況。
- This paper reviews comprehensively the recent development of amor- phous silicon films fabricated by light induced chemical vapour deposition(LCVD). 本文較系統地評述了光誘導化學(xué)汽相淀積(LCVD)技術(shù)淀積非晶硅薄膜的開(kāi)發(fā)現;
- The device contains chemical vapour sensors that react to the presence of volatile organic compounds, or VOCs, in a person’s exhaled breath. 這個(gè)裝置含有化學(xué)氣化感受器，能與人們所呼出氣體中揮發(fā)性有機成分相互反應。
- Thin film of tellurium was prepared by chemical vapour deposition on the polyethylene foils using room-temperature decomposition of electrochemically generated hydrogen telluride. 用化學(xué)氣相沉積法制備碲薄膜,其步驟為:通過(guò)電化學(xué)方法制得碲化氫,碲化氫在室溫下分解后在聚乙烯塑料箔上沉積得到碲薄膜。
- TiO 2 thin films were prepared by chemical vapour deposition(CVD) with the source of tetra iso propyl titanate (Tiliso OC 3H 7) 4,TPT) and its optical properties are studied. 以四異丙醇鈦（簡(jiǎn)稱(chēng)TPT）為鈦源物質(zhì)，采用常壓化學(xué)氣相沉積（CVD）法制備了TiO2膜，并對其光學(xué)性質(zhì)進(jìn)行了研究。
- C/C composites were prepared by needled felt with fibre volume fraction of 40%, 30% and 25% densifying through chemical vapour infiltration for three times. 摘要以40%25，30%25和25%253種不同纖維體積分數的針刺整體氈為坯體，經(jīng)3次化學(xué)氣相浸滲后制備C/C復合材料；
- New advance in chemical vapour deposition(CVD) , physical vapour deposition(PVD) .surfacemodification technology and other new technology in surface treatment were reviewed. 簡(jiǎn)要地評述了化學(xué)氣相沉積(CVD)、物理氣相沉積(PVD)、表面改性技術(shù)和其它表面處理技術(shù)的新進(jìn)展。
- The two major techniques used are Chemical Vapour Deposition (CVD) and Physical Vapour Deposition (PVD).These can result in the deposition of two-dimensional blanket or patterned thin films. 因此本實(shí)驗中將凹形及矩形之銅箔以疊加方式組合成一電極群，并藉由微細放電加工方法加工出具有數十道槽狀的微細散熱片。
- It is composed of pay-off stand, drawing machine, online continuous annealer, dual spooler or basket down coiler, electric control system, wire pointer &stripper, vapour generator. 機組由放線(xiàn)架，拉線(xiàn)主機，連續退火裝置，雙盤(pán)收線(xiàn)機或成圈下線(xiàn)機，電氣控制系統，軋頭穿模機，蒸汽發(fā)生器等組成。
- Cold vapour generation atomic absorption spectrometry 冷蒸氣原子吸收光譜法
- Physical and chemical vapour deposition 物理、化學(xué)氣相沉積
- chemical vapour deposition ( CVD ) 化學(xué)氣相沉積法（CVD）
- chemical vapour deposition (CVD) 化學(xué)氣相沉積
- thermally activated chemical vapour deposition 熱活化化學(xué)氣相沉積
- low pressure chemical vapour deposition 低壓化學(xué)氣相沉積
- tritiated water vapour generator system 氚氣流發(fā)生器
