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- SU-8光刻膠SU-8 photoresist
- SU-8光刻膠氧刻蝕的研究Study on Deep Reactive Ion Etching of SU-8 Photoresist
- 該傳感器采用微電子機械系統(MEMS)技術(shù)制備，以硅片作為基底，由鉑制備的平面雙電極結構以及SU-8光刻膠制備的微反應池所構成。The sensor, which is composed of two electrodes made of platinum and a micro reaction cell made of SU-8 photoresist, is fabricated on silicon wafer using the Micro-Electro-Mechanical Systems (MEMS) technology.
- SU-8光膠SU - 8 photoresist
- 光刻膠photosensitive resist
- H_2O_2、K_2S_2O_8光降解有機磷DDVP的研究Study on the Photodegradation of Organophosphrus DDVP
- 光刻photoetching
- 光刻膠傅里葉全息圖的記錄條件對重構圖像信噪比的影響The influence of recording conditions on the signal-to-noise ratio of retrieved images for photoresist Fourier transform holograms
- 特邀演講:將離子注入和光刻膠剝離后的襯底損失降低到超低程度Invited Speech: Ultra Low Substrate Loss Post Implant Strip Processes
- Ｘ射線(xiàn)光刻膠X-ray resist
- 厚膠光刻Lithography for thick film photo-resists
- 正性膠光刻positive resist lithography
- 用近貼式軟X射線(xiàn)光刻術(shù)研究DCPA光刻膠的曝光性能INVESTIGATION ON EXPOSURE CHARACTERISTICS 0F SOFT-X-RAY RESIST DCPA USING SOFT X-RAY CONTACT LITHOGRAPHY
- 紫外線(xiàn)厚膠光刻技術(shù)研究及應用Research and application of thick photoresist lithography using UV light
- 紫外壓印光刻中阻蝕膠殘膜刻蝕工藝Etching Process for Residual Resist Layer in Ultraviolet-Imprint Lithography
- 化學(xué)放大膠在電子束光刻技術(shù)中的應用Application of chemically amplified resists in electron beam lithography
- 壓印光刻對準中阻蝕膠層的設計及優(yōu)化Design and Optimization of Resist Film in Imprint Lithography Alignment Process
- SU-8厚膠光刻SU-8 thick photorcsist
- 厚膠光刻中曝光光強對光化學(xué)反應速率的影響Exposure intensity effect on the photochemical reaction speed in the lithography for thick film photo-resists
- 光刻膠附著(zhù)resist adhesion
