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- HfO2／SiO2HfO2/SiO2
- HfO2／SiO2溶膠-凝膠HfO2/SiO2 sol-gel
- HfO2hafnium dioxide
- HfO2薄膜HfO2 thin films
- HfO2膜料HfO2 coating material
- HfO2柵介質(zhì)HfO2 gate dielectric
- SiO2silicon dioxide
- 四方晶相HfO2tetragonal Hf02
- SiO2膜SiO2 film
- 四方HfO2晶體tetragonal HfO2 crystal
- Ag/SiO2Ag/SiO2
- HfO2-Al2O3復合薄膜HfO2-Al2O3 composite films
- 低SiO2low SiO2
- n-SiO2nano-SiO2
- 分兩步提取了HfO2高k柵介質(zhì)等效氧化層厚度(EOT).The equivalent oxide thickness (EOT) of an HfO_2 high k dielectric is extracted in two steps.
- Cu/SiO2Cu/SiO_2
- SiO2基silica based
- 研究了HfO2 薄膜在CHF3 /Ar和SF6/Ar等氣體中的反應離子刻蝕機理。Ion reactive etching mechanisms of HfO 2 films in CHF 3/Ar and SF 6/Ar plasma were experimentally studied to promote its potential application in fabrication of new generation CMOS.
- PI/SiO2PI/SiO2
- SiO2層SiO2 layer
