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- ECR濺射鍍膜ECR sputtering
- X模耦合微波的ECR濺射裝置的放電特性Discharge Characteristics of ECR Sputtering Apparatus Used X Mode Coupling Microwave
- 真空波導磁場(chǎng)控制型ECR濺射法的實(shí)驗研究Study of Magnetic Field Control Type ECR Sputtering Method Used Vaccum Waveguide
- 離子濺射鍍膜臺ion sputtering coater
- 直流磁控濺射鍍膜DC magnetron sputtering
- 直流磁控濺射鍍膜在玻璃涂層技術(shù)中的應用Application of DC Magnetron Sputtering Coating in the Glass Coating Technique
- 磁控濺射鍍膜中工作氣壓對沉積速率的影響Influence of the working gas pressure on the deposition rate in magnetron sputtering for thin coating
- 微波ECR等離子體源增強非平衡磁控濺射DLC膜的制備與表征Preparation and characterization of DLC films by microwave ECR plasma source enhanced unbalance magnetron sputtering
- 濺射鍍膜sputter coating
- 濺射鍍膜磁帶[化] sputtering tape
- 濺射態(tài)as-deposited
- 陰極濺射鍍膜法cathode sputtering process
- 濺射角Deposition surface inclination angle
- 交替濺射alternating sputtering
- 真空濺射鍍膜玻璃vacuum sputtering coated glass
- 濺射功率sputtering power
- 濺射氣壓sputtering pressure
- 間歇濺射fitful-sputtering
- 真空濺射鍍膜機繼電器-接觸器控制系統的設計與研究Design And Research of the Relay-contact Control System in The Vacuum Sputtering Coater
- 濺射時(shí)間sputtering time
