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- CH4和CO2重整CH4 and CO2 reforming reaction
- CH4和CO2排放CH4 and CO2 emission
- 生命周期co2排放lifecycle CO2 emissions
- 研究了CeO2 與Nb2 O5 和Co2 O3共摻雜的BaTiO3基X7R材料的介溫特性。The temperature dependence of dielectric properties of X7R materials based on CeO 2,Nb 2O 5 and Co 2O 3 co-doped BaTiO 3 was discussed.
- 用CH4和N，為載氣的SiCl4作原料，用H2為稀釋氣，在兩種氣體混合比和三種溫度下化學(xué)氣相沉積SiC涂層。CH4 and SiCl4 are used as raw material,N,as carrying gas for SiCl4 and H2 as dilution gas. CVD SiC coating is prepared with two kinds of ratio and three kinds of temperature.
- 內涵CO2排放CO2 emissions embodied in trade
- CH4和C2H4CH4 and C2 H6
- CH4和N2OCH4 and N2O
- CO2排放速率CO2 released rate
- 圖五所示為采用過(guò)程質(zhì)譜基于單點(diǎn)校正在不同濃度測量CO和CO2的線(xiàn)性度的測試結果。Additionally the linearity of the measurement by PMS has been verified by analyzing CO and CO2 at various concentrations based on a single-point calibration.
- （道德方面）促進(jìn)，提高，社會(huì )進(jìn)步提高社會(huì )，道德和智力標準的努力或運動(dòng)An effort or a movement to improve social, moral, or intellectual standards.
- 本文采用電子回旋共振微波等離子體化學(xué)氣相沉積方法(ECR-CVD),以CH4和H2為氣源、Fe3O4納米粒子為催化劑,未加電場(chǎng)情況下,在多孔硅基底上制備出大面積陣列碳納米管。The large area well-aligned carbon nanotube (CNT) arrays were synthesized on porous silicon by electron cyclotron resonance chemical vapor deposition (ECR-CVD) with CH4 and H2 as the source gases, Fe3O4 nanoparticle as the catalyst and without applying electrical field.
- N2O和CO2釋放通量N2O and CO2 emissions
- 全面實(shí)施以德育為核心、以創(chuàng )新精神和實(shí)踐能力為重點(diǎn)的素質(zhì)教育Carry on the quality education centering on moral education and emphasizing creativity and practice
- 讓溫馨的祝愿、幸福的思念和友好的祝福，在圣誕佳節來(lái)到你身邊，伴你左右。May the warmest wishes, happy thoughts and friendly greetings come at Christmas and stay with you all the year through.
- CO2排放CO2 emission
- 多讀和多說(shuō)英語(yǔ)，英語(yǔ)能力就會(huì )培養起來(lái)。English skills will accrue to you from speaking and reading a lot.
- 以CF4,CH4和N2為源氣體,采用射頻等離子體增強化學(xué)氣相沉積法,在不同射頻功率下制備了含氮氟化類(lèi)金剛石薄膜樣品.Nitrogen doped fluorinated diamond-like carbon(FN-DLC)thin films is deposited using radio frequency plasma enhanced chemical vapor deposition under different radio-frequency power with CF_4,CH_4 and N_2 as source gases.
- 大氣CH4atmospheric CH4
- SF6和CO2混合氣體SF6 and CO2 gas mixtures
