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- 納米晶Ninanocrystalline Ni
- 研究結果表明,在優(yōu)化的工藝條件下,可獲得應力為230 MPa、硬度高達988 HV、無(wú)裂紋的納米晶Ni-W薄膜材料,為其在MEMS微器件、微模具制備上的應用提供了有效途徑.The results show that in the optimum process,the nanocrystalline Ni-W film without crack can be obtained,and its stress is 230 MPa,hardness is 988 HV.In this way,Ni-W film may be widely applied in the manufacture of MEMS device and micro-molding.
- 硼離子注入對多晶Ni力學(xué)性能及微觀(guān)結構的影響EFFECTS OF B~+ IMPLANTATION ON MECHANICAL PROPERTIES AND MICROSTRUCTURE OF POLYCRYSTALLINE Ni
- 低能離子束轟擊對非晶Ni-P薄膜組織與性能的影響Influence of Low-Energy Ion Beams Bombardment on Mi crostructure and Properties of Amorphous Ni-P Film
- 納米晶Co-Ni合金nanocrystalline Co-Ni
- ZnO納米晶ZnO nanocrystal
- 納米晶鎳nanocrystalline nickel
- CdS納米晶CdS nanocrystal
- 納米晶化nanocrystallization
- 納米晶銅nanocrystalline copper
- Ge納米晶Ge nanocrystals
- 金納米晶gold nanocrystals
- 納米晶種nanosized seeds
- 銦納米晶indium nanocrystal
- InP納米晶indium phosphide nanocrystallite
- MgO納米晶magnesium oxide nanocrystallite
- BST納米晶BST nanocrystals
- 微納米晶micro-nanocrystal
- 納米晶Sinano-crystalline Si
- 納米晶鐵nano-grain iron
