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- It consists of a copper cylinder as the cathode base filled with titanium deuteride powder in the cavity of the cathode base as a sputter target material. 它由1 個(gè)圓柱形的銅陰極心和填滿(mǎn)其中心孔的氘化鈦濺射靶構成。
- The demand for sputtering target materials are increased with the rapid development of the electronic and information industries in the world. 隨著(zhù)電子及信息產(chǎn)業(yè)突飛猛進(jìn)的發(fā)展,世界濺射靶材的需求量越來(lái)越大。
- Technological Study of Powder Metallurgical High-pure Chrome for Sputtering Target Material 粉末冶金高純鉻和鉻合金濺射靶材燒結工藝研究
- Manufacture and application of sputtering target materials 濺射靶材的應用及制備初探
- Sputtering target materials for optical data storage 光信息存儲的濺鍍靶材
- Trend in development and applications of sputtering target materials 濺射靶材的應用及發(fā)展趨勢
- sputtering target materials 濺射靶材
- A new net-shape cathode sputtering target which has a simple structure and a high sputtering rate was put forward. 設計了一種網(wǎng)狀陰極濺射靶,它是由多個(gè)空心陰極并列交叉組合而成。
- A new net\|shape cathode sputtering target which has a simple structure and a high sputtering was put forward. 研究設計了一種網(wǎng)狀陰極濺射靶,它是由多個(gè)空心陰極并列交叉組合而成。
- Sputter targets and evaporation materials available upon request. 注:可按客戶(hù)要求加工各種形狀和尺寸的金屬靶材及蒸發(fā)材料。
- Many kinds of sputtering ceramic target materials are necessary for manufacturing in IT and their market scale of are increasing rapidly. 在信息產(chǎn)業(yè)不少基礎產(chǎn)品的制造過(guò)程中需使用多種陶瓷濺射靶材,世界陶瓷靶材的市場(chǎng)銷(xiāo)售規模日益擴大。
- The paper describes the technology for the preparation of ITO sputter target by CIP and sintering process. 采用冷等靜壓-燒結法制備了ITO磁控濺射靶材。
- Using sintered B4C as target material, ternary BCN thin films were synthesized by means of pulsed laser deposition assisted by nitrogen ion beam. 以燒結B4C為靶材料、在氮離子束輔助下用脈沖激光沉積方法制備了三元化合物硼碳氮(BCN)薄膜。
- AAM also offers 99.95 pure Nb sputtering Target for thin film applications.We supply ingot,plate and final target depending on customer needs. 中精倫也為高科技行業(yè)提供高純鈮靶,我們根據客戶(hù)的具體需要提供鑄錠、板材和最終靶材。
- The thermal shock wave is an important mechanic phenomenon of the material re-sponse preduced in the target material bombarded by electron beain. 熱擊波是電子束輻照靶材料時(shí)在其內產(chǎn)生材料響應的一個(gè)重要力學(xué)現象。
- Abstract: Fast photography is used to investigate the back-ejecta of tantalum target material after interaction with high intensity current pulse electron beam. 摘 要: 敘述了用高速攝影技術(shù)研究強流脈沖電子束與鉭金屬靶相互作用后靶材的回噴現象,得出了靶材回噴的速度。
- The tritium was produced after irradiation by proton beams for all target materials, especially there is 131I in lead target material. 所選靶材料在照射后會(huì )產(chǎn)生長(cháng)壽命放射性核素氚,其中,鉛靶材料中還會(huì )產(chǎn)生131I。
- The material is flawed throughout. 這種材料到處是裂縫。
- Bonding of Target Material and Backing Plate for 9900 Sputtering System 9900型靶材與靶托的連接技術(shù)
- He insists the condition to use the best material. 他堅持以使用最好的材料為條件。