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- The polarization modulator is composed of a polarizer,a Savart plate,two 1/4 wave plates,a photoelastic modulator and an analyzer. 該偏振調制器主要由起偏器、薩伐爾板、兩塊1/4波片、光彈調制器和檢偏器構成。
- It's the combination of modulator and demodulator. 調制解調器是由調制器和解調器組成。
- DIP switch,patch panel ,connector,modul etc. DIP開(kāi)關(guān)，綜合布線(xiàn)類(lèi)產(chǎn)品，（配線(xiàn)架，模塊，連接器，面板）
- Allosteric enzymes may have more than one modulator. 它可以有一個(gè)或多個(gè)調節物。
- Application of Photoelastic Modulator in Modulation of Polarization Direction 光彈調制器在偏振方向調制中的應用
- Output of encoder is inverted before input to modulator. 編碼器輸出在輸入前被轉換到調制器。
- Modulator control scheme for transmission. Default is AM. 傳送調制控制配置。缺省是。
- A method of realizing QPSK modulator based on FPGA is presented. 提出了一種基于FPGA實(shí)現QPSK調制器的方法。
- Lame-Maxwell equations of equilibrium have important applications in photoelasticity. 拉密-麥克斯韋平衡方程在光測彈性力學(xué)中具有重要的作用。
- Pulse width modulator and sample maintenance installment. 脈沖寬度調制器和取樣保持裝置。
- The ADC and the Class D share one analog deta-sigma modulator. 這種結構結合了連續型和離散型調制器各自的優(yōu)點(diǎn)，達到了面積和性能的折中。
- The modulator output is processed by an on-chip digital filter. 調制器輸出由片內數字濾波器處理。
- Liquid Crystal Spatial Light Modulator Based on BSO[J]. 引用該論文 Shi Tao;Huang Ziqiang;Zhang Cuiyu.
- Utilize FSK modulator, powerful anti-disturbing capability. 商品描述：采用FSK調制方式，抗干擾能力強。
- Quasi Velocity Matched Electrooptic Phase Modulator[J]. 引用該論文 郭鳳珍;于長(cháng)泰;小林哲郎.
- It consists of an analog modulator and a digital decimator. 它由一個(gè)模擬的調制器和一個(gè)數字降采樣濾波器組成。
- Keywords: digital photoelasticity, isochromatics, dark-field, light-field, sharpening, pixel. 關(guān)鍵詞：數位光彈、等色線(xiàn)、暗場(chǎng)、亮場(chǎng)、細線(xiàn)化、畫(huà)素。
- The acting form of the load at the joint of the bridge is discussed through a photoelasticity experiment. 通過(guò)光 彈性實(shí)驗，分析機器人橋架連接處的受力形式。
- Lame -Maxwell equations of equilibrium have important applications in photoelasticity. 拉密-麥克斯韋平衡方程在光測彈性力學(xué)中具有重要的作用。
- It is found that, for mode I cracks, the precision of photoelasticity technique is hi gher than that of caustic method. 以光彈性法及焦散線(xiàn)法的基本原理為基礎,對兩種方法在確定應力強度因子方面進(jìn)行了比較。
