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- An apparatus and process for atomic layer deposition that minimizes mixing of the chemicals and reactive gases is disclosed. 在本發(fā)明中提供了一種用于原子層沉積的裝置和方法，該裝置和方法能減小化學(xué)用品和反應氣體的混合。
- Theory and Applications of Atomic Layer Deposition 單原子層沉積原理及其應用
- Development in Atomic Layer Deposition and Its Applications 原子層沉積技術(shù)及應用發(fā)展概況
- Atomic layer deposition and its applications in semiconductor 原子層沉積技術(shù)及其在半導體中的應用
- Principle and Application of Ferroelectric Films by Atomic Layer Deposition 原子層沉積技術(shù)及其在鐵電薄膜制備中的應用
- Keywords Atomic layer deposition（ALD）;Low-pressure chemical vapor deposition（LPCVD）;Holographic lithography（HL）;Direct laser writing （DLW）; 原子層沉積;化學(xué)氣相沉積;激光全息光刻;激光直寫(xiě)技術(shù);
- Atomic layer deposition 原子層沉積
- In this thesis, the alternative high-k dielectrics made by atomic layer chemical vapor deposition are used to instead of silicon dioxide. 本論文中，就是以原子層化學(xué)汽相沉積的高介電系數的材料來(lái)取代二氧化矽。
- The diffusion coefficient of RaA atoms,being 0.071cm~2/s,was determinedusing two-filter wall deposition method. 采用壁沉積方法;測得 RaA 的擴散系數 D=0.;071cm~2/s。
- TiO2 films were prepared by sol-gel and print screen method, MgO/TiO2 films were prepared by liquid deposition method. 用sol-gel法和絲網(wǎng)印刷法制備多孔TiO2薄膜,溶液沉積法制備MgO/TiO2復合薄膜。
- The ATOMIC layer, highlighted in yellow, enables the development of a unified grid infrastructure. ATOMIC層以黃色表示,它可以用來(lái)開(kāi)發(fā)統一的網(wǎng)格基礎設施。
- The pearly pigment of mica titanium was prepared by using the liquid deposition method with the urea as precipitant. 采用尿素作為中和劑,用液相沉積法制備了云母鈦珠光顏料。
- This resulted in a rough and bead-shaped surface, obstructing a smooth layer deposition. 球化的出現妨礙了直接金屬激光燒結成形的順利進(jìn)行。
- A template-free electrochemical deposition method for preparations of ZnO nanorod array is reported. 摘要報道了一種氧化鋅納米線(xiàn)陣列的無(wú)模板電沉積制備方法。
- Abstract： C-N films were synthesized on high-resistance Si(111) substrates by cluster beam deposition method. 利用荷能團簇沉積裝置在高阻硅(111)襯底上沉積了碳氮薄膜。
- The uniaxial tensile deformation and shear deformation of nano bicrystal copper within (111) atomic layer are studied with molecular dynamics. 模擬結果顯示納米銅雙晶的拉伸與剪切變形都是由彈性變形與塑性變形兩個(gè)階段構成。
- Atomic Layer Deposition. International Conference. 6Th 2006. (2 Cd-Roms) Ald 2006 (Presentations And Posters)/ Held 24-26 July 2006, Seoul, Korea. 2006年第6屆國際原子層沉積會(huì )議會(huì )議錄（2光盤(pán)）（演示和海報）
- BaTiO_3/SrTiO_3 (BTO/STO) multilayer films have been fabricated on Pt/Ti/SiO_2/Si substrates by a pulsed laser deposition method. 采用脈沖激光沉積法在Pt/Ti/SiO2/Si襯底上制備了BaTiO3/SrTiO3(BTO/STO)多層膜。
- The plating used an economical copper replacement deposition method that differs from general electrodeless-plating pretreatment. 利用簡(jiǎn)單、低成本的置換沉積銅法新工藝，進(jìn)行表面金屬化處理。
- The mechanical behavior of nano-single crystal and nano-bicrystal copper within (111) atomic layer under static tensile loading is studied with molecular dynamics. 用分子動(dòng)力學(xué)方法模擬了納尺度銅單晶與銅雙晶的(111)面原子的靜拉伸力學(xué)行為。
