When silicon evaporation arte was 0.2nm/s, the oxygen concentration in the epitaxial film wasthe same as in the substrate.是什么意思_When silicon evaporation arte was 0.2nm/s, the oxygen concentration in the epitaxial film wasthe same as in the substrate.在線(xiàn)翻譯_英語(yǔ)_讀音_用法_例句