Using the processes with lowest formed damage and AuGeNi/Au/GaAs ohmic contact, Al/AlGaAs Schottky barrier, polyimide pro-tecting film, we have developed the InGaAs/AlGaAs PM-HEMT.

 
  • 采用低應力、低損傷工藝程序,以AuGeNi/Au形成源漏歐姆接觸,Al形成柵肖特基勢壘接觸,聚酰亞胺介質(zhì)為鈍化膜,制成了InGaAs/AlGaAs贗配HEMT。
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