This paper introduces basic technology of copper interconnect, including single and dual damascene technology, CMP technology, low k dielectric materials, barrier materials and reliability of copper interconnect.
英
美
- 文中介紹了基本的銅互連布線(xiàn)技術(shù) ,包括單、雙鑲嵌工藝 ,CMP工藝 ,低介電常數材料和阻擋層材料 ,及銅互連布線(xiàn)的可靠性問(wèn)題