This is achieved by using a unique multi beam technology, demonstrated in figure 2, which reduces the power density, minimizes the thermal load, and reduces the kerf width in the wafer.

 
  • 這是采用獨特的多光束技術(shù)實(shí)現的,圖2顯示了其工作原理,降低了功率密度,減小了熱負載,縮小了刻線(xiàn)寬度。
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