This inversion will lead to an additional 1800 relative rotation between the diffraction pattern and micrograph that would not be detectable in the double exposure technique illustrated in Fig. l .3.
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- 圖表1.;3所示的雙曝光技術(shù)中對于衍射模型和顯微圖并沒(méi)有表示出來(lái),這個(gè)倒置,就在衍射模型和顯微圖之間形成了一個(gè)額外的1800相關(guān)旋轉。