This feature can be eliminated via mechanical polishing and followed by chemical etching, and hence only exciton line was observed for the damage-removed sample.

 
  • 此篇論文中所有的化合物半導體單晶樣品,在做光學(xué)量測之前,皆有經(jīng)過(guò)機械磨光以及化學(xué)蝕刻的處理。
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