The rectifying properties of La_(0.8)Sr_(0.2)MnO_3(LSMO)/Si with SrMnO_3(SMO) as barrier layer were compared with the one without SMO,prepared by using RF magnetron sputtering on Silicon substrate.

 
  • 對用磁控濺射方法在硅基上直接沉積La0.;8Sr0
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