The nanosecond pulsed laser annealing of GDa-Si:H films has been studied by scanning electron microscope,X-ray diffraction and infrared absorption.

 
  • 本文報道用電子顯微鏡觀(guān)察、X-射線(xiàn)衍射和紅外吸收譜等方法研究 a-Si:H 薄膜的毫微秒(ns)脈沖激光退火的結果。
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