The microstructure and optical properties of epitaxial laterally overgrown (ELO) GaN films on Si (III) substrate by hydrade vapor phase epitaxy (HVPE) have been investigated.

 
  • 用氫化物氣相外延 (HVPE)方法在Si(III)襯底上成功橫向外延生長(cháng)出晶體質(zhì)量較好的GaN薄膜材料。
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