The maximum x-directional strain of NMOS channel is 0.6% when the model is gave 1GP of the intrinsic stress of the silicon nitride capping layer under a temperature loading of -400K.

 
  • 對于奈米結構而言,本研究所建立之模擬方式可詳盡探討彎矩對應變矽之力學(xué)行為,并可依此對NMOS元件進(jìn)行分析與設計。
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