The escalating cost of these tools for conventional optical and extreme ultraviolet (EUV) lithography is driven in part by the need for complex optical sources and optics.

 
  • 壓印系統之對位重點(diǎn)有二:其一為晶圓面與母模之平行度,其中將采用氣壓方式使之自動(dòng)平行校準;
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