The TiN thin films were produced on die steel surface by the method of CO2 continuous laser chemical vapor deposition(LCVD)with wavelength 10.6 mm,the microstructure and morphology of which was analyzed by XRD,OM,SEM,and EDS.
英
美
- 利用波長(cháng)為10.;6mm的CO2連續激光誘導化學(xué)氣相沉積的方法;在模具鋼基體上沉積TiN類(lèi)薄膜。 采用XRD、OM、SEM、EDS等手段分析薄膜的組織和相結構。