Sputtering process will have the same problem as investment of vacuum equipment and uniformity for large scale. The usage rate & cost of target will affect the future of development.

 
  • 濺散程序將為大的刻度有真空設備和同樣的和投資相同的問(wèn)題。用法率和目標的費用將影響發(fā)展的未來(lái)。
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