Si/Ti atomic ratio of the deposited thin films was mensurated by ICP-AES. TiO2/SiO2 thin films were characterised by XRD, FTIR and BET methods. Photocatalytic activity of TiO2/SiO2 thin films was evaluated by degradation of methylene blue as a probe.
英
美
- 用ICP-AES測定TiO_2/SiO_2復合薄膜中Si/Ti原子比,用BET法測定了薄膜上粉體的比表面積,用XRD、FTIR三點(diǎn)全反射光譜法等對TiO_2/SiO_2復合薄膜進(jìn)行了表征,并用亞甲藍的降解,評價(jià)了TiO_2/SiO_2復合薄膜的光催化活性。
