Self-bias voltage of the dielectric substrate surface and voltage of the driven electrode were experimentally studied to improve the energy control of impinging ion in plasma processes.

 
  • 在薄膜沉積和離子束刻蝕技術(shù)中,通常要給絕緣基片加上一個(gè)射頻或脈沖電極,以便在絕緣基片上形成一個(gè)自偏壓來(lái)控制轟擊到絕緣基片表面的離子能量。
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