RF Plasma System 9200 is a barrel-type batch stripping system with optional high temperature capabilities for photoresist removal, nitride etch, and other cleaning applications in semiconductor and MEMS fabs.

 
  • 射頻等離子體9200是桶式爐脫模體;擁有可控制的高溫系統可去除光阻材料、氮化物蝕刻和半導體與微型機電系統等方面的清洗功能.
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