Over etching or under etching in IC process causes the variation of the linewidth and spacing between two parallel lines because of the random disturbance of the process.是什么意思_Over etching or under etching in IC process causes the variation of the linewidth and spacing between two parallel lines because of the random disturbance of the process.在線(xiàn)翻譯_英語(yǔ)_讀音_用法_例句