Meanwhile, Salicide-Block process is applied on photo diode area to avoid heavy metal contamination during Salicide formation, then dark current caused by heavy metal defect is suppressed.

 
  • 同時(shí),采用了對像素區域進(jìn)行SAB遮蓋的方法,避免了硅化物工藝帶來(lái)的重金屬污染,從而降低了暗電流。
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