Line defects can be created holographically in the photonic crystals by an additional exposure with proper intensity and then develop the recording medium to high contrast.

 
  • 在分析有缺陷的光子晶體時(shí),我們利用重覆曝光和把記錄介質(zhì)沖洗到高對比的方法,并適當的控制雷射的強度,可制造出有線(xiàn)缺陷的全像光子晶體。
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