Kohler illumination was used in proximity lithography,and a fly s eye lens was adopted to form multi-point source in order to uniform the light intensity on the mask plane.

 
  • 接近式光刻中一般采用柯勒照明系統,并采用蠅眼透鏡形成多點(diǎn)光源均勻掩模面的光場(chǎng)分布。
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