It was found that there exist many nanometer-sized holes on the surface of SiN buffer layers, and such porous SiN layers probably could enhance the lateral growth.

 
  • 在氮化矽緩沖層表面可以發(fā)現許多奈米尺寸大小的孔洞,其特性相信可提升之后氮化鎵側向的磊晶成長(cháng)。
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