In order to expand the kind of backing material and produce thick film (>50um) of low inner stress and other high performance film, a pulsed negative bias voltage technique is using in the AIP craft along with the developing of pulsed power technology.

 
  • 為了擴大電弧離子鍍的基材范圍和用電弧離子鍍設備制備出內應力較低的更厚鍍層以及其它類(lèi)型應用的高性能鍍層,隨著(zhù)脈沖功率技術(shù)的發(fā)展,一種脈沖負偏壓工藝開(kāi)始用于電弧離子鍍技術(shù)。
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