In TEM results, we find that H2 process lead to stronger indium confinement in the well layers and can suppress the spinodal decomposition in the rim part of the wafer.

 
  • 在高解析度穿透式電子顯微術(shù)結果中,我們發(fā)現經(jīng)由氫氣的處理,銦原子主要局限于井層,同時(shí)也減輕晶圓的邊緣處的銦密集的效應。
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