H- passivating Si surface has been achieved by using chemical method, and the nanometer-scale line structure with 5Onm on Si surface has been made by using STM selective oxidation and chemical etch.

 
  • 利用化學(xué)方法實(shí)現氫鈍化Si表面,研制確定了STM選擇局域氧化的制備工藝,制備了5onm的氧化硅線(xiàn)條結構,利用化學(xué)腐蝕將此圖形轉移到硅襯底上。
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