For sake of probing the possibility of CVD at room temperature by way of laser plasma assisted technique, a new style of CVD device has been designed and manufactured, and was used on practical preparation of Si 3N 4 film from SiH 4 NH 3 N 2 system.

 
  • 為探索用激光和等離子體共同輔助化學(xué)氣相沉積(CVD)過(guò)程以實(shí)現室溫沉積的可能性,設計并制造了一種新型的CVD裝置,實(shí)際進(jìn)行了由SiH4-NH3-N2體系制取Si3N4膜的試驗。
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