Distribution and precipitation of Ni in Si were studied by atomic absorption spectrometry (AAS), X-Ray fluorescence analysis (XRF) and scaning electron microscope (SEM) . The concentration of Ni is much higher at Si surface than in the interior.

 
  • 用原子吸收光譜和X射線(xiàn)熒光光譜,測得Ni在Si中的分布為內部濃度低,表面濃度高的U形分布。
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