Compact Plasma Focus (CPF) device (NX2) operating in neon with high performance and high repetition rate is developed and used as an intense Soft X-Ray (SXR) source for microelectronics lithography.

 
  • 我們研制了一套以微電子光刻為應用背景的緊湊型高重復率、高性能、工作氣體為氖氣的等離子焦點(diǎn)裝置(NX2)做為軟X射線(xiàn)源。
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