By changing electrode contour, main shield shape, the gap length between electrode and shield and adding poising shield, the factors affecting its electric field distribution were studied.

 
  • 通過(guò)采取改變觸頭輪廓、調整主屏蔽罩形式以及其與觸頭之間的距離、增加均壓屏蔽罩等方式,對影響滅弧室內部電場(chǎng)分布的因素進(jìn)行了研究。
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