Bi 4Ti 3O 12 ferroelectric thin films were prepared on Si(100)substrates by chemical solution deposition (CSD). The results of X ray diffraction (XRD)patterns show the films have good orientation.

 
  • 本文采用化學(xué)溶液沉積 (CSD)工藝在Si(10 0 )襯底上制備了Bi4 Ti3O12 鐵電薄膜 ,這種薄膜的X射線(xiàn)衍射 (XRD)結果顯示其具有較好的結晶性。
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