After two layers of SiO2/ SiON with different refractive are finished, the designed mask pattern is printed on the film by photolithography, then through ICP for dry etching, the waveguide structures are obtained, for example AWG/EDG we obtained.
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- 兩層不同折射率的二氧化硅/氮氧化硅薄膜制備好后,再根據設計好的波導圖形,經(jīng)過(guò)光刻,感應耦合等離子體刻蝕(ICP)等工藝,制成所需要的光波導器件,如本研究中心制成的AWG、EDG等。