According to the technical process of ion beam etching on Diffractive Optical Element (DOE), a distribution of surface error in ion beam etching was presented.

 
  • 摘要針對衍射光學(xué)元件(DOE)的離子束刻蝕工藝,結合掩模套刻過(guò)程實(shí)例,本文提出了刻蝕誤差面形分布的概念。
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