A technique is presented for the vapour phase epitaxy of GaxIn1-xAs in the system of AsCl3/Ga/In/H2 using a Ga/In alloy sources it is characteristic of excellent reproducibility, homogeneity and ease-to-obtain GaxIn1-xAs layers with high purity.

 
  • 本文描述了一種汽相外延Ga_xIn_(1-x)As的技術(shù):在A(yíng)sCl_3/Ga/In/H_2體系中,采用Ga/In合金源汽相生長(cháng)Ga_xIn_1As。
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