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- 利用磁控濺射的方法在氧化后的單晶Si基片上制備了TiNi形狀記憶合金薄膜,利用示差掃描量熱法和原位X射線(xiàn)衍射研究了薄膜的馬氏體相變特征。In this work, TiNi shape memory alloy films on oxidized single crystal Si substrate were successfully prepared by co-sputtering of TiNi target with a separated Ti target. The transformation behavior was investigated by differential scanning calorimeter (DSC) and in-situ XRD.
- 單晶爐single crystal furnace
- TGS單晶TGS crystal
- YSZ單晶YSZ single crystal
- 體單晶bulk crystal
- 超單晶superindividual
- 單晶 多晶柵single poly gate
- 蒽單晶anthracene single crystal
- 鉬單晶molybdenum single crystal
- 單晶層single crystalline layer
- 單晶的monomorph
- 單晶錠single crystal ingot
- 單晶膜single crystal film
- 單晶片處理single wafer processing
- 單晶掐single crystal device
- 單晶絲monocrystalline wire
- 單晶糖lump sugar in small crystal
- 單晶物monomorph
- 單晶矽mono-crystal silicon
